Liquid crystal display including wire grid polarizer and manufacturing method thereof

ABSTRACT

A liquid crystal display includes a first substrate. A plurality of fine metal lines is disposed on the first substrate. The plurality of fine metal lines including a plurality of small regions. A second substrate is aligned with the first substrate. A light blocking portion is disposed on the second substrate. The light blocking portion is disposed in a region between the small regions of the plurality of small regions of the plurality of tine metal lines.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a Division of co-pending U.S. patent applicationSer. No. 13/470,929, filed on May 14, 2012, which claims priority to andthe benefit of Korean Patent Application 10-2011-0118304 filed in theKorean Intellectual Property Office on Nov. 14, 2011, the entirecontents of Which are incorporated herein by reference.

TECHNICAL FIELD

The present invention relates to a liquid crystal display, and moreparticularly, to a liquid crystal display including a wire gridpolarizer and a manufacturing method thereof.

DISCUSSION THE RELATED ART

The liquid crystal display (LCD) is one of the most common types of flatpanel displays currently in production. LCDs may include two panels onwhich field generating electrodes such as a pixel electrode and a commonelectrode are formed. A liquid crystal layer is interposed between thetwo panels. The liquid crystal display generates an electric field on aliquid crystal layer by applying voltage to the field generatingelectrodes and determines the orientation of liquid crystal molecules ofthe liquid crystal layer by the generated electric field, thuscontrolling polarization of incident light so as to display images.

In general, polarizing plates are attached onto external surfaces of thepanels on which the field generating electrodes are formed to controlpolarization of incident light. Each polarizing plate may be anabsorption type polarizing plate which absorbs light that does not havethe desired polarization. Therefore, only a small part of a light sourcesupplying light to the liquid crystal display by the polarizing plate isused for displaying an image and as a result, light efficiency of thelight source of the liquid crystal display is lowered.

SUMMARY

Exemplary embodiments of the present invention provide a liquid crystaldisplay including a large area wire grid polarizer without increasing amanufacturing cost and deteriorating a polarization characteristic, anda manufacturing method thereof.

An exemplary embodiment of the present invention provides a liquidcrystal display including a first substrate. A plurality of fine metallines is disposed on the first substrate and includes a plurality ofsmall regions. A second substrate is aligned with the first substrate. Alight blocking portion is disposed on the second substrate, in which thelight blocking portion is disposed, in a region between the plurality ofsmall regions of the plurality of fine metal lines.

In the plurality of small regions, the plurality of fine metal lines maybe disposed to have predetermined widths at predetermined intervals in apredetermined direction.

The widths of the plurality of fine metal lines may be approximately 60nm or less.

The intervals the plurality of fine metal lines may be approximately 120nm or less.

The entire area of the plurality of fine metal lines may be 200 mm×2.00mm or more

A plurality of pixel areas may be disposed on the second substrate andthe plurality of small regions may be disposed in the plurality of pixelareas.

The plurality of pixel areas may include first pixel areas and secondpixel areas. In the first pixel area, the plurality of fine metal linesmay be uniformly disposed in a first direction. In the second pixelarea, the plurality of fine metal lines may be uniformly disposed in asecond direction that is different from the first direction.

The second direction may be perpendicular to the first direction.

An exemplary embodiment of the present invention provides a method formanufacturing a liquid crystal display including stacking a metal layeron a first substrate. A photosensitive film layer is stacked on themetal layer. A photosensitive film pattern is formed on thephotosensitive film layer by a nano-imprint method using a mold. Theforming of the photosensitive film pattern may be repeated plural timeswhile moving the mold. A plurality of fine metal patterns including aplurality of small regions corresponding to the molds is formed byetching the metal layer using the photosensitive film pattern. A lightblocking portion is formed on a second substrate. The light blockingportion is disposed on boundary portions of the plurality of smallregions by aligning the first substrate and the second substrate.

An exemplary embodiment of the present invention provides a method formanufacturing a liquid crystal display including stacking an etchcontrol layer on a first substrate. A first photosensitive film layer isstacked on the etch control layer. A first photosensitive film patternis formed on the first photosensitive film layer by a nano-imprintmethod using a first mold. The forming of the first photosensitive filmpattern is repeated plural times while moving the first mold. Aplurality of etch control patterns is formed by etching the etch controllayer using the first photosensitive film pattern. A first metal layeris stacked on the etch control patterns. A large area second moldincluding a plurality of first small regions corresponding to the firstmolds is formed by separating the metal layer from the etch controlpatterns. A second metal layer is stacked on a second substrate. Asecond photosensitive film layer is stacked on the second metal layer. Asecond photosensitive film pattern is formed on the secondphotosensitive film layer by a nano-imprint method using the secondmold. A plurality of fine metal patterns including a plurality of secondsmall regions of the second mold is formed by etching the second metallayer using the second photosensitive film pattern. A light blockingportion is formed on a third substrate. The light blocking portion isdisposed at boundary portions of the plurality of second small regionsby aligning the second substrate and the third substrate.

An exemplary embodiment of the present invention provides a method ofmanufacturing a liquid crystal display including stacking an etchcontrol layer on a first substrate. A first photosensitive film layer isstacked on the etch control layer. A first photosensitive film patternis formed on the first photosensitive film layer by a nano-imprintmethod using a first mold. The forming of the first photosensitive filmpattern is repeated plural times while moving the first mold. Aplurality of etch control patterns is formed by etching the etch controllayer using the first photosensitive film pattern. A first metal layeris stacked on the etch control pattern. A large area second moldincluding a plurality of first small regions corresponding to the firstmolds is formed by separating the metal layer from the etch controlpatterns. A second photosensitive film layer is stacked on a secondsubstrate. A second photosensitive film pattern is formed on the secondphotosensitive film layer by a nano-imprint method using the secondmold. A plurality of fine metal patterns having a plurality of secondsmall regions of the second mold is formed by stacking a metal layer onthe second photosensitive film pattern. A light blocking portion isformed on a third substrate. The light blocking portion is disposed onboundary portions of the plurality of second small regions by aligningthe second substrate and the third substrate.

According to exemplary embodiments of the present invention, a largearea wire grid polarizer is formed using a small area mold in which asignal line or a light blocking member is disposed at connectionportions of the molds or connection portions between the small area wiregrid polarizers. Deterioration in a polarization characteristic due toan arrangement difference of the connection portions between the wiregrid polarizers may thereby be reduced or prevented. Accordingly, aliquid crystal display including a large area wire grid polarizer may beformed without increasing a manufacturing cost and without deterioratingthe polarization characteristic.

BRIEF DESCRIPTION THE DRAWINGS

A more complete appreciation of the present disclosure and many of theattendant aspects thereof will be readily obtained as the same becomesbetter understood by reference to the following detailed descriptionwhen considered in connection with the accompanying drawings, wherein:

FIG. 1 is a layout view of a liquid crystal display according to anexemplary embodiment of the present invention;

FIG. 2 is a layout view of a liquid crystal display according to anexemplary embodiment of the present invention;

FIG. 3 is a layout view of the liquid crystal display according to anexemplary embodiment of the present invention;

FIG. 4 is a cross-sectional view showing a method of manufacturing theliquid crystal display according to an exemplary embodiment of thepresent invention;

FIGS. 5 and 6 are cross-sectional views showing a method ofmanufacturing the liquid crystal display according to an exemplaryembodiment of the present invention; and

FIG. 7 is a cross-sectional view showing a method of manufacturing theliquid crystal display according to an exemplary embodiment of thepresent invention.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Exemplary embodiments of the present invention will be described morefully hereinafter with reference to the accompanying drawings. As thoseskilled in the art would realize, the described exemplary embodimentsmay be modified in various different ways, all without departing fromthe spirit or scope of the present invention.

In the drawings, the thickness of layers, films, panels, regions, etc.,may be exaggerated for clarity. Like reference numerals may designatelike elements throughout the specification. When an element such as alayer, film, region, or substrate is referred to as being “on” anotherelement, it can be directly on the other element or intervening elementsmay also be present.

Hereinafter, a liquid crystal display and a manufacturing method thereofaccording to an exemplary embodiment of the present invention will bedescribed with reference to the accompanying drawings.

A liquid crystal display according to an exemplary embodiment of thepresent invention will be described with reference to FIG. 1. FIG. 1 isa layout view of a liquid crystal display according to an exemplaryembodiment of the present invention. Referring to FIG. 1, a liquidcrystal display according an exemplary embodiment of the presentinvention includes a first wire grid polarizer 30 including a pluralityof small regions A1. Line widths of fine patterns of the first wire gridpolarizer 30 may be approximately 60 nm or less, Distances d between thefine patterns of the first wire grid polarizer 30 may be approximately120 nm or less. The entire area of the first wire grid polarizer 30 maybe approximately 200 mm×200 mm or more.

A light blocking portion LB is disposed at boundary portions between thesmall regions A1 of the first wire grid polarizer 30. The light blockingportion LB may be a metal signal line such as a gate line, a data line,and a storage voltage line or a black matrix.

The first wire grid polarizer 30 may be formed by repeating a step offorming the small region A1.

As described above, in the liquid crystal display according to anexemplary embodiment of the present invention, the wire grid polarizer30 having a large area is formed to include the plurality of smallregions A1. The light blocking portion LB is disposed at the boundaryportions between the small regions A1 of the wire grid polarizer 30 toprevent light from being transmitted. Accordingly, deterioration in apolarization characteristic which may occur at the boundary portionsbetween the small regions A1 of the wire grid polarizer 30 may bereduced or prevented. Therefore, the liquid crystal display includingthe large area wire grid polarizer may be provided without increasing amanufacturing cost or deteriorating the polarization characteristic.

A liquid crystal display according to an exemplary embodiment of thepresent invention will be described with reference to FIG. 2. FIG. 2 isa layout view of a liquid crystal display according to an exemplaryembodiment of the present invention.

Referring to FIG. 2, the liquid crystal display according to anexemplary embodiment of the present invention includes a plurality ofpixel areas PX and second wire grid polarizers 30 a which are disposedat aperture regions of the pixel areas PX.

The second wire grid polarizers 30 a are formed together on a displaypanel on which pixel electrodes of the plurality of pixel areas PX ofthe liquid crystal display are formed, and may be, for example, disposedon the aperture regions of the pixel areas PX through which light from abacklight is transmitted. Line widths of fine patterns of the secondwire grid polarizer 30 a may be approximately 60 nm or less, Distancesbetween the fine patterns of the second wire grid polarizer 30 a may beapproximately 120 nm or less. The entire area of the first wire gridpolarizer 30 may be 200 mm×200 mm or more.

The second wire grid polarizer 30 a includes a plurality of smallregions which are disposed on the aperture regions of the pixel areasPX. Boundary portions between the plurality of small regions are coveredby a light blocking member BM. Therefore, since in the boundary portionsof the plurality of small regions of the second wire grid polarizer 30 athe light is prevented from being transmitted by the light blockingmember BM, deterioration in a polarization characteristic which mayoccur at the boundary portions of the plurality of small regions of thesecond wire grid polarizer 30 a may be reduced or prevented.Accordingly, a liquid crystal display including the large area wire gridpolarizer may be provided without increasing a manufacturing cost ordeteriorating the polarization characteristic.

A liquid crystal display according to an exemplary embodiment of thepresent invention will be described with reference to FIG. 3. FIG. 3 isa layout view of the liquid crystal display according to an exemplaryembodiment of the present invention.

Referring to FIG. 3, a liquid crystal display according to an exemplaryembodiment of the present invention includes a plurality of first pixelareas PX1 and a plurality of second pixel areas PX2, Third wire gridpolarizers 30 h and 30 c are disposed on aperture regions of the firstand second pixel areas PX1 and PX2, respectively. The third wire gridpolarizers 30 b and 30 c include first polarization portions and secondpolarization portions, respectively.

The first polarization portions including fine metal lines arranged in afirst direction are disposed in the first pixel areas PX1 and the secondpolarization portions including fine metal lines arranged in a seconddirection different from the first direction are disposed in the secondpixel areas PX2. The second direction may be perpendicular to the firstdirection.

The third wire grid polarizers 30 b and 30 c are formed together on adisplay panel on which pixel electrodes of the plurality of pixel areasPX of the liquid crystal display are formed. For example, the third wiregrid polarizers 30 b and 30 c may be disposed on the aperture regions ofthe pixel areas PX through which light from a backlight is transmitted.Line widths of fine patterns of the third wire grid polarizers 30 b and30 c may be approximately 60 nm or less. Distances between the finepatterns of the third wire grid polarizers 30 b and 30 c may beapproximately 120 nm or less. The entire area of the first wire gridpolarizer 30 may be 200 mm×200 mm or more.

In the liquid crystal display according to an exemplary embodiment, thefirst polarization portions 30 b disposed in the first pixel areas PX1and the second polarization portions 30 c disposed in the second pixelareas PX2 polarize light in directions perpendicular to each other. Thisstructure is used for a liquid crystal display for displaying a 3D imageby making polarization directions of a left eye and a right eyedifferent. For example, the first pixel areas PX1 may be pixel areaswhich are recognized by the left eye and the second pixel areas PX2 maybe pixel areas which are recognized by the right eye.

The third wire grid polarizers 30 b and 30 c include a plurality ofsmall regions disposed on the aperture regions of pixel areas PX.Boundary portions of the plurality of small regions are covered by alight blocking member BM. Therefore, since in the boundary portions ofthe plurality of small regions of the third wire grid polarizers 30 band 30 c, the light is prevented from being transmitted by the lightblocking member BM, deterioration in a polarization characteristic whichmay occur at the boundary portions of the plurality of small regions ofthe third wire grid polarizers 30 b and 30 c may be minimized orprevented. Accordingly, it is possible to provide the liquid crystaldisplay including the large area wire grid polarizer without increasinga manufacturing cost and deteriorating the polarization characteristic.

A method of manufacturing the liquid crystal display according to anexemplary embodiment of the present invention will be described withreference to FIG. 4. FIG. 4 is a cross-sectional view showing a methodfor manufacturing the liquid crystal display according to an exemplaryembodiment of the present invention.

Referring to FIG. 4A, in a method of manufacturing a polarizer of theliquid crystal display according to an exemplary embodiment of thepresent invention, a small area first mold 301 is manufactured. The moldmay be formed of silicon, glass, nickel (Ni), resist, and the like andmay be used repeatedly. The mold is formed by a photolithography methodso as to have a width and a distance of for example, 50 nm.

Referring to FIG. 4B, a metal layer 12 is stacked on a substrate 11, aphotosensitive film is stacked on the metal layer 12, and then a firstphotosensitive film pattern 13 a is formed from the photosensitive filmby a nano-imprint method using a plurality of first molds 301. A hardmask layer such as silicon oxide (SiO₂) or the like may be stackedbetween the metal layer 12 and the photosensitive film. When the hardmask layer is provided, it is possible to increase a margin of anetching condition at the time of etching as shown in FIG. 4C. The metallayer 12 may include any one of aluminum (Al), gold (Au), silver (Ag),copper (Cu), chromium (Cr), and iron (Fe), According to an exemplaryembodiment, the plurality of first molds 301 are used, but a singlefirst mold 301 may also be used. Further, the first photosensitive filmpattern 13 a is formed on a portion of the entire area on which thepolarizer is formed and after the mold is moved, the firstphotosensitive film pattern 13 a is formed again. These steps arerepetitively performed and as a result, the first photosensitive filmpattern 13 a may be formed in a large area.

Thereafter, referring to FIG. 4C, after a recess portion of thephotosensitive film pattern 13 a is removed, the metal layer 12 isetched using the photosensitive film pattern 13 a as a mask and theremaining photosensitive film pattern is removed by an ashing process,thereby forming a polarizer having a desired fine first metal pattern 12a. At this time, a second metal pattern 12 b different from the firstmetal pattern 12 a may be formed on a region between the plurality offirst molds 301. The second metal pattern 12 b may also act as apolarizer.

The manufactured polarizer is aligned with a manufactured display panel,and thus, the second metal pattern 12 b of the polarizer is aligned witha light blocking portion of the display panel, thereby forming a liquidcrystal display.

In a liquid crystal display according to an exemplary embodiment of thepresent invention, as shown in FIG. 4D, after the photosensitive film isstacked again on the substrate on which the first metal pattern 12 a andthe second metal pattern 12 b are formed, a second photosensitive filmpattern 13 b is formed by nano-imprinting a portion formed with thesecond metal pattern 12 b using the first molds 301. After removing arecess portion of the second photosensitive film pattern 13 b, a thirdmetal pattern 12 c is formed by a double nano-imprint method of etchingthe second metal pattern 12 b using the second photosensitive filmpattern 13 b as an etching mask. The third metal pattern 12 c may alsocover the boundary portions. The fine metal patterns 12 a and 12 c maybe formed on the entire polarizer by the double nano-imprint method.However, even though the double nano-imprint method is used, intervalsbetween the fine metal patterns 12 a and 12 c may not be uniform atboundary portions due to an arrangement error of the mold 301 and theboundary portions may be aligned with the light blocking portion of thedisplay panel.

As described above, in the liquid crystal display according to anexemplary embodiment of the present invention, the polarizer is formedby repeating the nano-imprint process using the mold having a smallerarea than the entire area of the polarizer. The boundary portionsbetween the small regions of the polarizer are aligned with the lightblocking portion of the display panel, thereby preventing deteriorationin the polarization characteristic which may occur at the boundaryportions of the plurality of small regions of the polarizer.Accordingly, a liquid crystal display including a large area wire gridpolarizer may be provided without increasing a manufacturing cost ordeteriorating the polarization characteristic.

A method of manufacturing a liquid crystal display according to anexemplary embodiment of the present invention will be described withreference to FIGS. 5 and 6. FIGS. 5 and 6 are cross-sectional viewsshowing a method of manufacturing the liquid crystal display accordingto an exemplary embodiment of the present invention.

A method of manufacturing a mold will be described with reference toFIG. 5.

Referring to FIG. 5A, in a method of manufacturing a polarizer of theliquid crystal display according to an exemplary embodiment of thepresent invention, a small area first mold 301 a is manufactured. Themold may be formed of silicon, glass, nickel (Ni), resist, and the likeand may be used repeatedly. The mold is formed by a photolithographymethod in order to have a width and a distance of for example, 50 nm.

After an etch control layer 120 is stacked on a substrate 11 and aphotosensitive film is stacked on the etch control layer 120, a thirdphotosensitive film pattern 130 a is formed by a nano-imprint methodusing the first mold 301 a.

Thereafter, referring to FIG. 5B, after removing a recess portion of thephotosensitive film pattern 130 a, the etch control layer 120 is etchedusing the photosensitive film pattern 130 a as a mask and the remainingphotosensitive film pattern is removed by an asking process, therebyforming a desired fine first etch control pattern 120 a and a secondetch control pattern 120 b disposed at a boundary portion of the firstetch control pattern 120 a.

Referring to FIG. 5C, a fourth photosensitive film pattern 130 b isformed by an additional double nano-imprint method and as shown in FIG.5D, after removing a recess portion of the fourth photosensitive filmpattern 130 b, the second etch control pattern 120 b of the etch controllayer 120 is etched again using the fourth photosensitive film pattern130 b as a mask, thereby forming a third etch control pattern 120 c.Herein, the steps shown in FIG. 5C and FIG. 5D may be optionallyomitted,

Referring to FIG. 5E, a metal layer 140 is stacked on the substrate 12including the first etch control pattern 120 a and the third etchcontrol pattern 120 c by electroplating or the like, and then the metallayer 140 is separated, thereby forming a large area second mold 302 asshown in FIG. 5F. Further, the large area second mold 302 is formed asshown in FIG. 5F by the nano-imprint method.

Next, as shown in FIG. 6A, a second metal layer 121 is stacked on asubstrate 11, a photosensitive film is stacked on the second metal layer121, and then a fifth photosensitive film pattern 131 is formed usingthe large area second mold 302 formed with reference to FIG. 5.

As shown in FIG. 6B, after removing a recess portion of the fifthphotosensitive film pattern 131, the second metal layer 121 is etchedusing the fifth photosensitive film pattern 131 as an etching mask,thereby forming a polarizer on which a desired fourth metal pattern 121a is disposed in a large area.

Thereafter, a part between small regions corresponding to regions inWhich the first molds 301 a are disposed when the second mold 302 isformed, is aligned with a light blocking portion of a display panel.Accordingly, deterioration in a polarization characteristic of thepolarizer which may occur between the small regions of the polarizer maybe reduced or prevented. Accordingly, it is possible to provide theliquid crystal display including the large area wire grid polarizerwithout increasing a manufacturing cost and deteriorating thepolarization characteristic.

A method for manufacturing a liquid crystal display according to anexemplary embodiment of the present invention will be described withreference to FIG. 5 and FIG. 7.

First, as described above with reference to FIG. 5, the large areasecond mold 302 is formed.

Thereafter, as shown in FIG. 7A, a photosensitive film is stacked on asubstrate 11 and a sixth photosensitive film pattern 122 is formed by anano-imprint method using the second mold 302. Then, as shown in FIG.7B, a metal layer is stacked on the sixth photosensitive film pattern122, thereby forming a polarizer on which a desired fifth metal pattern122 a is disposed in a large area.

Thereafter, a part between small regions corresponding to regions in thefirst molds 301 a are disposed when the second 302 is formed, is alignedwith a light blocking portion of a display panel. Accordingly, it ispossible to prevent deterioration in a polarization characteristic ofthe polarizer Which may occur between the small regions of thepolarizer. Accordingly, it is possible to provide the liquid crystaldisplay including the large area wire grid polarizer without increasinga manufacturing cost and without deteriorating the polarizationcharacteristic.

While exemplary embodiments of the present invention have been describedin connection with the figures, it is to be understood that theinvention is not limited to the disclosed embodiments, but is intendedto cover various modifications and equivalent arrangements.

What is claimed is:
 1. A method for manufacturing a liquid crystaldisplay, the method comprising: stacking a metal layer on a firstsubstrate; stacking a photosensitive film layer on the metal layer;forming a photosensitive film pattern on the photosensitive film layerby a nano-imprint method using a mold; repeating the forming of thephotosensitive film pattern multiple times while moving the mold betweeneach repetition; forming a plurality of fine metal patterns including aplurality of small regions that correspond to the mold by etching themetal layer using the photosensitive film pattern; forming a lightblocking portion on a second substrate; and disposing the light blockingportion on boundary portions of the plurality of small regions byaligning the first substrate and the second substrate.
 2. The method ofclaim 1, wherein; in the plurality of small regions, each of theplurality of fine metal lines are disposed to have predetermined widthand width in a predetermined direction.
 3. The method of claim 2,wherein: a plurality of pixel areas is disposed on the second substrateand the plurality of small regions is disposed in the plurality of pixelareas.
 4. The method of claim 3, wherein: the plurality of pixel areasinclude first pixel areas and second pixel areas, in the first pixelareas, each the plurality of fine metal lines is formed to uniformlyextend in a first direction, and in the second pixel areas, each of theplurality of fine metal lines is formed to uniformly extend in a seconddirection different from the first direction.
 5. The manufacturingmethod of a liquid crystal display of claim 4, wherein: the seconddirection is perpendicular to the first direction.
 6. A method formanufacturing a liquid crystal display, comprising: stacking an etchcontrol layer on a first substrate; stacking a first photosensitive filmlayer on the etch control layer; forming a first photosensitive filmpattern on the first photosensitive film layer by a nano-imprint methodusing a first mold; repeating the forming of the first photosensitivefilm pattern multiple times while moving the first mold betweenrepetitions; forming a plurality of etch control patterns by etching theetch control layer using the first photosensitive film pattern; stackinga first metal layer on the etch control patterns; forming a large areasecond mold including a plurality of first small regions correspondingto the first mold by separating the metal layer from the etch controlpatterns; stacking a second metal layer on a second substrate; stackinga second photosensitive film layer on the second metal layer; forming asecond photosensitive film pattern on the second photosensitive filmlayer by a nano-imprint method using the second mold; forming aplurality of fine metal patterns including a plurality of second smallregions of the second mold by etching the second metal layer using thesecond photosensitive film pattern; forming a light blocking portion ona third substrate; and disposing the light blocking portion at boundaryportions of the plurality of second small regions by aligning the secondsubstrate and the third substrate.
 7. The m method of claim 6, wherein:in the plurality of second small regions, each of the plurality of finemetal lines are disposed to have predetermined width and interval in apredetermined direction.
 8. A method of manufacturing a liquid crystaldisplay, comprising: stacking an etch control layer on a firstsubstrate; stacking a first photosensitive film layer on the etchcontrol layer; forming a first photosensitive film pattern on the firstphotosensitive film layer by a nano-imprint method using a first mold;repeating the forming of the first photosensitive film pattern multipletimes while moving the first mold between repetitions; forming aplurality of etch control patterns by etching the etch control layerusing the first photosensitive film pattern; stacking a first metallayer on the etch control pattern; forming a large area second moldincluding a plurality of first small regions corresponding to the firstmold by separating the metal layer from the etch control patterns;stacking a second photosensitive film layer on a second substrate;forming a second photosensitive film pattern on the secondphotosensitive film layer by as nano-imprint method using the secondmold; forming a plurality of fine metal patterns having a plurality ofsecond small regions of the second mold by stacking a metal layer on thesecond photosensitive film pattern; forming a light blocking portion ona third substrate; and disposing the light blocking portion on boundaryportions of the plurality of second small regions by aligning the secondsubstrate and the third substrate.
 9. The method of claim 8, wherein: inthe plurality of second small regions, each of the plurality of finemetal lines are disposed to have predetermined width and interval in apredetermined direction.